X-Rays and Extreme Ultraviolet Radiation

X-Rays and Extreme Ultraviolet Radiation PDF

Author: David Attwood

Publisher: Cambridge University Press

Published: 2017-02-16

Total Pages:

ISBN-13: 1316810666

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With this fully updated second edition, readers will gain a detailed understanding of the physics and applications of modern X-ray and EUV radiation sources. Taking into account the most recent improvements in capabilities, coverage is expanded to include new chapters on free electron lasers (FELs), laser high harmonic generation (HHG), X-ray and EUV optics, and nanoscale imaging; a completely revised chapter on spatial and temporal coherence; and extensive discussion of the generation and applications of femtosecond and attosecond techniques. Readers will be guided step by step through the mathematics of each topic, with over 300 figures, 50 reference tables and 600 equations enabling easy understanding of key concepts. Homework problems, a solutions manual for instructors, and links to YouTube lectures accompany the book online. This is the 'go-to' guide for graduate students, researchers and industry practitioners interested in X-ray and EUV interaction with matter.

Soft X-Rays and Extreme Ultraviolet Radiation

Soft X-Rays and Extreme Ultraviolet Radiation PDF

Author: David Attwood

Publisher: Cambridge University Press

Published: 2007-02-22

Total Pages: 611

ISBN-13: 1139643428

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This detailed, comprehensive book describes the fundamental properties of soft X-rays and extreme ultraviolet (EUV) radiation and discusses their applications in a wide variety of fields, including EUV lithography for semiconductor chip manufacture and soft X-ray biomicroscopy. The author begins by presenting the relevant basic principles such as radiation and scattering, wave propagation, diffraction, and coherence. He then goes on to examine a broad range of phenomena and applications. The topics covered include spectromicroscopy, EUV astronomy, synchrotron radiation, and soft X-ray lasers. The author also provides a wealth of useful reference material such as electron binding energies, characteristic emission lines and photo-absorption cross-sections. The book will be of great interest to graduate students and researchers in engineering, physics, chemistry, and the life sciences. It will also appeal to practising engineers involved in semiconductor fabrication and materials science.

Soft x-rays and extreme ultraviolet radiation

Soft x-rays and extreme ultraviolet radiation PDF

Author: David Attwood

Publisher:

Published: 2000

Total Pages: 470

ISBN-13: 9781139641326

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This self-contained, comprehensive book describes the fundamental properties of soft X-rays and extreme ultraviolet (EUV) radiation and discusses their applications in a wide variety of fields, including EUV lithography for semiconductor chip manufacture and soft X-ray biomicroscopy. The book will be of great interest to graduate students, researchers and practising engineers.

Nanoscale Photonic Imaging

Nanoscale Photonic Imaging PDF

Author: Tim Salditt

Publisher: Springer Nature

Published: 2020-06-09

Total Pages: 634

ISBN-13: 3030344134

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This open access book, edited and authored by a team of world-leading researchers, provides a broad overview of advanced photonic methods for nanoscale visualization, as well as describing a range of fascinating in-depth studies. Introductory chapters cover the most relevant physics and basic methods that young researchers need to master in order to work effectively in the field of nanoscale photonic imaging, from physical first principles, to instrumentation, to mathematical foundations of imaging and data analysis. Subsequent chapters demonstrate how these cutting edge methods are applied to a variety of systems, including complex fluids and biomolecular systems, for visualizing their structure and dynamics, in space and on timescales extending over many orders of magnitude down to the femtosecond range. Progress in nanoscale photonic imaging in Göttingen has been the sum total of more than a decade of work by a wide range of scientists and mathematicians across disciplines, working together in a vibrant collaboration of a kind rarely matched. This volume presents the highlights of their research achievements and serves as a record of the unique and remarkable constellation of contributors, as well as looking ahead at the future prospects in this field. It will serve not only as a useful reference for experienced researchers but also as a valuable point of entry for newcomers.

Efficient Extreme Ultra-Violet Mirror Design

Efficient Extreme Ultra-Violet Mirror Design PDF

Author: Yen-Min Lee

Publisher: IOP Publishing Limited

Published: 2021-09-23

Total Pages: 150

ISBN-13: 9780750326506

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Extreme ultraviolet (EUV) lithography is a next generation platform with the potential to extend Moore's Law. The EUV mirror is a fundamental component of this system. Efficient Extreme Ultraviolet Mirror Design describes an approach to designing EUV mirrors with reduced computational time and memory requirements, providing a comprehensive grounding in the fundamentals of the EUV mirror and knowledge of the finite-difference time-domain (FDTD) method. The discussion is made timely by the opening of commercial avenues for the application of EUV as it begins to be implemented in the development of 5G, AI, edge computing, VR and the Internet of Things. This book explores the theory, function and fabrication of EUV mirrors, as well as the correlation between design by Fresnel's equations and design by photonic bands, and develops a rigorous and efficient FDTD method by applying these considerations to three simulation cases. Intended primarily for EUV industry professionals, Efficient Extreme Ultraviolet Mirror Design will be of particular use to researchers investigating large scale problems or near-field scattering problems in EUV lithography. It will serve as an excellent reference text for anyone working in or studying optical engineering, as well as a high-level introduction for researchers from other fields interested in photolithography and the FDTD method. Key Features Addresses knowledge of extreme ultraviolet (EUV) mirrors and EUV lithography. Establishes a relation between photonic bands and Fresnel's equation. Introduces the high reflectivity EUV mirror design rules. Applies numerical simulation for EUV mirror design. Details efficient finite-difference time-domain (FDTD) approach.

Contribution of X-ray and Extreme Ultraviolet Radiation of Solar Flares to Sudden Frequency Deviations

Contribution of X-ray and Extreme Ultraviolet Radiation of Solar Flares to Sudden Frequency Deviations PDF

Author: Richard Frank Donnelly

Publisher:

Published: 1969

Total Pages: 52

ISBN-13:

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High time and intensity resolution satellite measurements of X-ray and extreme ultraviolet (EUV) radiation during solar flares are studied to determine the wavelength dependence of the flare radiation responsible for sudden frequency deviations (SFD). SFD's measure the flare-induced effects in the E and F1 regions of the ionosphere and are in effect like a broadband (1-1030 Å) detector for impulsive flare enhancements. He II 303.8 Å, O V 629.7 Å, H Ly [upsilon] 972.5 Å, C III 977.0 Å, and H Ly [alpha] 1215.7 Å were found to have essentially the same time dependence as the total ionizing radiation producing SFD's, except that they decay faster than the net 1-1030 Å radiation. Flare enhancements of Fe XV 284.1 Å, Fe XVI 335.3 Å, Si XII 499.3 Å. Mg X 625.3 Å, and Ne VIII 770.4 Å, which are normally coronal lines, appear to have a much slower time dependence than the radiation responsible for SFD's. X-rays in the 0.5-3 Å range are slightly slower than the radiation responsible for SFD's during the decay stage; 1-8 Å X-ray flares are slower, especially during the decay stages; and 8-20 Å flare radiation enhancements are slower throughout the entire SFD.

Controlling the Quantum World

Controlling the Quantum World PDF

Author: National Research Council

Publisher: National Academies Press

Published: 2007-06-21

Total Pages: 245

ISBN-13: 0309102707

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As part of the Physics 2010 decadal survey project, the Department of Energy and the National Science Foundation requested that the National Research Council assess the opportunities, over roughly the next decade, in atomic, molecular, and optical (AMO) science and technology. In particular, the National Research Council was asked to cover the state of AMO science, emphasizing recent accomplishments and identifying new and compelling scientific questions. Controlling the Quantum World, discusses both the roles and challenges for AMO science in instrumentation; scientific research near absolute zero; development of extremely intense x-ray and laser sources; exploration and control of molecular processes; photonics at the nanoscale level; and development of quantum information technology. This book also offers an assessment of and recommendations about critical issues concerning maintaining U.S. leadership in AMO science and technology.

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