Thin films of silicon on metallurgical silicon substrates
Author: Southern Methodist University
Publisher:
Published: 1977
Total Pages: 36
ISBN-13:
DOWNLOAD EBOOK →Author: Southern Methodist University
Publisher:
Published: 1977
Total Pages: 36
ISBN-13:
DOWNLOAD EBOOK →Author: Southern Methodist University
Publisher:
Published: 1977
Total Pages: 28
ISBN-13:
DOWNLOAD EBOOK →Author: Vijay Narayanan
Publisher: World Scientific
Published: 2016-08-15
Total Pages: 550
ISBN-13: 9814740497
DOWNLOAD EBOOK →This volume provides a broad overview of the fundamental materials science of thin films that use silicon as an active substrate or passive template, with an emphasis on opportunities and challenges for practical applications in electronics and photonics. It covers three materials classes on silicon: Semiconductors such as undoped and doped Si and SiGe, SiC, GaN, and III-V arsenides and phosphides; dielectrics including silicon nitride and high-k, low-k, and electro-optically active oxides; and metals, in particular silicide alloys. The impact of film growth and integration on physical, electrical, and optical properties, and ultimately device performance, is highlighted.
Author: Ram Ekwal Sah
Publisher: The Electrochemical Society
Published: 2005
Total Pages: 606
ISBN-13: 9781566774598
DOWNLOAD EBOOK →Author: Robert W. Collins
Publisher:
Published: 2001-04-10
Total Pages: 1118
ISBN-13:
DOWNLOAD EBOOK →The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Author: Vijay Narayanan
Publisher:
Published: 2016
Total Pages: 550
ISBN-13: 9789814740487
DOWNLOAD EBOOK →"This volume provides a broad overview of the fundamental materials science of thin films that use silicon as an active substrate or passive template, with an emphasis on opportunities and challenges for practical applications in electronics and photonics. It covers three materials classes on silicon: Semiconductors such as undoped and doped Si and SiGe, SiC, GaN, and III-V arsenides and phosphides; dielectrics including silicon nitride and high-k, low-k, and electro-optically active oxides; and metals, in particular silicide alloys. The impact of film growth and integration on physical, electrical, and optical properties, and ultimately device performance, is highlighted."--Publisher's website.
Author: Electrochemical Society. Meeting
Publisher: The Electrochemical Society
Published: 2003
Total Pages: 652
ISBN-13: 9781566773478
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