-PDF Download- Structure And Evolution Of Surfaces Volume 440 EBOOK

Structure and Evolution of Surfaces: Volume 440

Author: Robert C. Cammarata

Publisher:

Published: 1997-11-13

Total Pages: 536

ISBN-13:

This book brings together an interdisciplinary group of surface physicists, chemists and materials scientists to present the most current advances in the area of surface science. Both scientific and technological issues are addressed. Topics include: surface and step structure; morphology, roughness and instabilities; kinetic processes; nucleation on surfaces and interfaces; mechanics of surfaces; self-assembled and Langmuir-Blodgett films; thin-film surfaces and growth; chemistry and modification of surfaces and metal-semiconductor interfaces.

Thin Films - Structure and Morphology: Volume 441

Author: Steven C. Moss

Publisher:

Published: 1997-07-29

Total Pages: 904

ISBN-13:

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An interdisciplinary group of materials scientists, physicists, chemists and engineers come together in this book to discuss recent advances in the structure and morphology of thin films. Both scientific and technological issues are addressed. Work on thin films for a host of applications including microelectronics, optics, tribology, biomedical technologies and microelectromechanical systems (MEMS) are featured. Topics include: kinetics of growth; grain growth; instabilities, segregation and ordering; silicides; metallization; stresses in thin films; deposition and growth simulations; energetic growth processes; diamond films and carbide and nitride films.

Glasses and Glass Formers - Current Issues: Volume 455

Author: C. A. Angell

Publisher:

Published: 1997-07-08

Total Pages: 544

ISBN-13:

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This book brings together researchers from various backgrounds dealing with the manifestations of the glassy or liquid state of matter, and with the ubiquitous characteristics of the structure and dynamic properties. The goal of this book is to compare the relative merits of different theoretical, computational and experimental approaches to the subject, and to promote the exchange of ideas between the individual disciplines. Papers reflect state-of-the-art knowledge on processes involved in glass formation, and on the relationships between structure and properties of glass-forming liquids, synthetic polymers and biopolymers. Emphasis is on novel experimental techniques, developments in computational methods, and on recent theoretical models which are improving the understanding of the observed phenomena. Topics include: short-time dynamics; relaxation dynamics of glasses and glass formers; glass-like systems, simulations and models; contrasting metallic, ionic, bio and polymer systems; structure, energetics and polyamorphism; and structure and dynamics of glasses and glass formers.

Science and Technology of Semiconductor Surface Preparation: Volume 477

Author: Gregg S. Hagashi

Publisher:

Published: 1997-09-30

Total Pages: 576

ISBN-13:

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The focus of semiconductor wafer processing is rapidly changing. Pure device performance is no longer sufficient to ensure a technology's success as IC chips approach 1GB. Yield, reliability, cost and manufacturability are principal drivers of the industry. Great strides have been made in understanding the science and impact of front-end (pre-metal) chemical surface preparations and are beginning to influence the 'real' technology and its evolution. Efforts in understanding particle and metals removal, along with Si surface etching and microroughness are prime examples of areas where work is beginning to pay off together with processes related to the back-end (post-metal). The focus of this book is to report new findings and to discuss surface preparation with an emphasis on gaining a mechanistic understanding of the underlying science upon which the technology is based. Topics include: megasonic cleaning; SC1 technology; surface preparation and gate oxide reliability; CMP/CMP cleaning; post-etch processing; surface microroughness; wet chemical cleaning and gate oxide integrity; analytical studies of surfaces; wet chemical cleaning/etching; dry wafer cleaning; and environmentally friendly processing.

Statistical Mechanics in Physics and Biology: Volume 463

Author: Denis Wirtz

Publisher:

Published: 1997

Total Pages: 360

ISBN-13:

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Since statistical physics is a tool for the study not only of disordered physical systems, but of biological systems as well, this book from MRS focuses on both. While including physical problems such as fractals, pattern formation at first-order phase transitions, and glassy dynamics, the book also focuses on problems such as the statistical mechanics of DNA and DNA replications, structuring in biological systems, and problems in 'biologically inspired physics'. Topics include: statistical mechanics of proteins; statistical mechanics of DNA; biologically inspired physics; statistical mechanics in biology; micromanipulation in physics and biology; friction and fracture; statistical mechanics in physics and granular media.

Scientific Basis for Nuclear Waste Management XX: Volume 465

Author: Walter J. Gray

Publisher:

Published: 1997-07

Total Pages: 1398

ISBN-13:

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This book features scientific research that supports the safe and effective disposal of radioactive waste in a geological repository. One highlight of the volume is the opening talk by Rustum Roy, who was instrumental in establishing the first symposium on this topic in 1978. Professor Roy summarizes his views of the past 19 years of progress in the field. A second highlight is the participation by several Russian and Ukrainian scientists who authored papers on nuclear waste disposal aspects of the Chernobyl Unit 4 reactor that exploded in April 1986. Additional topics include: glass formulations and properties; glass/water interactions; cements in radioactive waste management; ceramic and crystalline waste forms; spent nuclear fuel; waste processing and treatment; radiation effects in ceramics, glasses and nuclear waste materials; waste package materials; radionuclide solubility and speciation; radionuclide sorption; radionuclide transport; repository backfill; performance assessment; natural analogues and excess plutonium dispositioning.

Microstructure Evolution During Irradiation: Volume 439

Author: Ian M. Robertson

Publisher:

Published: 1997-06-25

Total Pages: 770

ISBN-13:

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This book from MRS discusses the evolution of a material's microstructure as a result of its interaction with energetic particles such as ions, neutrons or electrons. The book is inter-disciplinary and emphasizes all classes of materials including metals, intermetallic compounds, ceramics, polymers, superconductors, semiconductors and insulators. A strong focus is placed on experimental techniques for measuring and quantifying damage and microstructure changes, and on computer simulation techniques for predicting and understanding this phenomena. Topics include: ion-implantation damage in semiconductors; radiation damage in metals; radiation damage in ceramics; radiation effects in polymers and beam-induced effects.

Low-Dielectric Constant Materials II: Volume 443

Author: André Lagendijk

Publisher:

Published: 1997-08-19

Total Pages: 224

ISBN-13:

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Low-dielectric constant materials are needed to improve the performance and speed of future integrated circuits. In fact, the diversity of contributors to this book is testimony to the global significance of the topic to the future of semiconductor manufacturing. Presentations include those by semiconductor equipment manufacturers and chemical source suppliers, academia from six countries, four government laboratories and five major device manufacturers. Approaches to designing and implementing reduction in dielectric constant for intermetal dielectric materials are featured and range from the evolution of silicon dioxide to fluorinated silicate glass, to the use of inorganic/organic polymers and spin-on-material, to fluorinated diamond-like carbon and nanoporous silica. The book also addresses the practical aspects of the use of low-dielectric constant materials such as chemical mechanical polishing of these materials and optimization of wiring delays in devices utilizing low-k material.

Interfacial Engineering for Optimized Properties: Volume 458

Author: Clyde L. Briant

Publisher:

Published: 1997-07-08

Total Pages: 546

ISBN-13:

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The study of interfaces is one of the oldest areas of research in materials science. The presence of grain boundaries in materials has long been recognized, as has its crucial role in determining mechanical properties. Another long-recognized concept is that the properties of a surface are quite different from those of the bulk. In recent years, researchers have been able to study these interfaces, both internal and external, with a detail not before possible. These advances have stemmed from the ability to obtain atomic resolution images of interfaces, to measure accurate chemical compositions of interfaces, and to model these interfaces and their properties. This volume goes a step further, beyond structural and chemical studies, to explore how all of this information can be used to engineer interfaces for improved properties and overall improved material performance. Significant attention is given to the crystallographic nature of grain boundaries and interfaces, and the relationship between this nature and the performance of a material. The versatility of electron back-scattering pattern analysis (EBSP) in solving a number of interface-related problems is also featured.

Low-dielectric Constant Materials

Author:

Publisher:

Published: 1997

Total Pages: 320

ISBN-13:

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