MEMS Materials and Processes Handbook

MEMS Materials and Processes Handbook PDF

Author: Reza Ghodssi

Publisher: Springer Science & Business Media

Published: 2011-03-18

Total Pages: 1211

ISBN-13: 0387473181

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MEMs Materials and Processes Handbook" is a comprehensive reference for researchers searching for new materials, properties of known materials, or specific processes available for MEMS fabrication. The content is separated into distinct sections on "Materials" and "Processes". The extensive Material Selection Guide" and a "Material Database" guides the reader through the selection of appropriate materials for the required task at hand. The "Processes" section of the book is organized as a catalog of various microfabrication processes, each with a brief introduction to the technology, as well as examples of common uses in MEMs.

Handbook of Silicon Based MEMS Materials and Technologies

Handbook of Silicon Based MEMS Materials and Technologies PDF

Author: Markku Tilli

Publisher: Elsevier

Published: 2020-04-17

Total Pages: 1028

ISBN-13: 012817787X

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Handbook of Silicon Based MEMS Materials and Technologies, Third Edition is a comprehensive guide to MEMS materials, technologies, and manufacturing with a particular emphasis on silicon as the most important starting material used in MEMS. The book explains the fundamentals, properties (mechanical, electrostatic, optical, etc.), materials selection, preparation, modeling, manufacturing, processing, system integration, measurement, and materials characterization techniques of MEMS structures. The third edition of this book provides an important up-to-date overview of the current and emerging technologies in MEMS making it a key reference for MEMS professionals, engineers, and researchers alike, and at the same time an essential education material for undergraduate and graduate students. Provides comprehensive overview of leading-edge MEMS manufacturing technologies through the supply chain from silicon ingot growth to device fabrication and integration with sensor/actuator controlling circuits Explains the properties, manufacturing, processing, measuring and modeling methods of MEMS structures Reviews the current and future options for hermetic encapsulation and introduces how to utilize wafer level packaging and 3D integration technologies for package cost reduction and performance improvements Geared towards practical applications presenting several modern MEMS devices including inertial sensors, microphones, pressure sensors and micromirrors

Digital Vlsi Design

Digital Vlsi Design PDF

Author: Singh Ajay Kumar

Publisher: PHI Learning Pvt. Ltd.

Published: 2010-06-30

Total Pages: 360

ISBN-13: 8120341872

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This well-organised book provides an in-depth coverage of VLSI design engineering, which ranges from CMOS logic to physical design automation. The book begins with a discussion on the structure and operation of MOS as MOSFET is the basic building block for any VLSI design. Then, it goes on to explain the various fabrication methods of MOSFET and CMOS, implementation and properties of MOS inverter circuit, and parasitic parameters and resistances associated with MOSFET, which determine and ultimately limit the performance of a digital system. Besides, it describes design methodology and the concept of the combinational static logic circuits, sequential circuit design and CMOS dynamic circuits. Finally, the book examines semiconductor memory and the importance of adder and multiplier circuits for the VLSI designer. Primarily intended as a text for the undergraduate and postgraduate students of Electrical and Electronics Engineering, the book would also be of considerable value to designers both beginners and professionals. Key Features: Provides mathematical derivations for both noise margin and logic voltage. Explains all combinational and sequential logics separately. Contains a large number of solved and unsolved problems based on issues related to digital VLSI design.

Introduction to Microfabrication

Introduction to Microfabrication PDF

Author: Sami Franssila

Publisher: John Wiley & Sons

Published: 2010-10-29

Total Pages: 534

ISBN-13: 1119991897

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This accessible text is now fully revised and updated, providing an overview of fabrication technologies and materials needed to realize modern microdevices. It demonstrates how common microfabrication principles can be applied in different applications, to create devices ranging from nanometer probe tips to meter scale solar cells, and a host of microelectronic, mechanical, optical and fluidic devices in between. Latest developments in wafer engineering, patterning, thin films, surface preparation and bonding are covered. This second edition includes: expanded sections on MEMS and microfluidics related fabrication issues new chapters on polymer and glass microprocessing, as well as serial processing techniques 200 completely new and 200 modified figures more coverage of imprinting techniques, process integration and economics of microfabrication 300 homework exercises including conceptual thinking assignments, order of magnitude estimates, standard calculations, and device design and process analysis problems solutions to homework problems on the complementary website, as well as PDF slides of the figures and tables within the book With clear sections separating basic principles from more advanced material, this is a valuable textbook for senior undergraduate and beginning graduate students wanting to understand the fundamentals of microfabrication. The book also serves as a handy desk reference for practicing electrical engineers, materials scientists, chemists and physicists alike. www.wiley.com/go/Franssila_Micro2e

MEMS and NEMS

MEMS and NEMS PDF

Author: Sergey Edward Lyshevski

Publisher: CRC Press

Published: 2018-10-03

Total Pages: 263

ISBN-13: 1351836137

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The development of micro- and nano-mechanical systems (MEMS and NEMS) foreshadows momentous changes not only in the technological world, but in virtually every aspect of human life. The future of the field is bright with opportunities, but also riddled with challenges, ranging from further theoretical development through advances in fabrication technologies, to developing high-performance nano- and microscale systems, devices, and structures, including transducers, switches, logic gates, actuators and sensors. MEMS and NEMS: Systems, Devices, and Structures is designed to help you meet those challenges and solve fundamental, experimental, and applied problems. Written from a multi-disciplinary perspective, this book forms the basis for the synthesis, modeling, analysis, simulation, control, prototyping, and fabrication of MEMS and NEMS. The author brings together the various paradigms, methods, and technologies associated with MEMS and NEMS to show how to synthesize, analyze, design, and fabricate them. Focusing on the basics, he illustrates the development of NEMS and MEMS architectures, physical representations, structural synthesis, and optimization. The applications of MEMS and NEMS in areas such as biotechnology, medicine, avionics, transportation, and defense are virtually limitless. This book helps prepare you to take advantage of their inherent opportunities and effectively solve problems related to their configurations, systems integration, and control.

Plasma Processing for VLSI

Plasma Processing for VLSI PDF

Author: Norman G. Einspruch

Publisher: Academic Press

Published: 2014-12-01

Total Pages: 544

ISBN-13: 1483217752

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VLSI Electronics: Microstructure Science, Volume 8: Plasma Processing for VLSI (Very Large Scale Integration) discusses the utilization of plasmas for general semiconductor processing. It also includes expositions on advanced deposition of materials for metallization, lithographic methods that use plasmas as exposure sources and for multiple resist patterning, and device structures made possible by anisotropic etching. This volume is divided into four sections. It begins with the history of plasma processing, a discussion of some of the early developments and trends for VLSI. The second section, Deposition, discusses deposition techniques for VLSI such as sputtering metals for metallization and contacts, plasma-enhanced chemical vapor deposition of metals and suicides, and plasma enhanced chemical vapor deposition of dielectrics. The part on Lithography presents the high-resolution trilayer resist system, pulsed x-ray sources for submicrometer x-ray lithography, and high-intensity deep-UV sources. The last part, Etching, provides methods in etching, like ion-beam etching using reactive gases, low-pressure reactive ion etching, and the uses of inert-gas ion milling. The theory and mechanisms of plasma etching are described and a number of new device structures made possible by anisotropic etching are enumerated as well. Scientists, engineers, researchers, device designers, and systems architects will find the book useful.

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