Compound Semiconductors 1994, Proceedings of the Twenty-First INT Symposium on Compound Semiconductors held in San Diego, California, 18-22 September 1994

Compound Semiconductors 1994, Proceedings of the Twenty-First INT Symposium on Compound Semiconductors held in San Diego, California, 18-22 September 1994 PDF

Author: Herb Goronkin

Publisher: CRC Press

Published: 1995-01-01

Total Pages: 946

ISBN-13: 9780750302265

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Compound Semiconductors 1994 provides a comprehensive overview of research and applications of gallium arsenide, indium phosphide, silicon carbide, and other compound semiconducting materials. Contributed by leading experts, the book discusses growth, characterization, processing techniques, device applications, high-power, high-temperature semiconductor devices, visible emitters and optoelectronic integrated circuits (OEICs), heterojunction transistors, nanoelectronics, and nanophotonics, and simulation and modeling. The book is an essential reference for researchers working on the fabrication of semiconductors, characterization of materials, and their applications for devices, such as lasers, photodiodes, sensors, and transistors, particularly in the high-speed telecommunications industries.

Semiconductor Silicon Crystal Technology

Semiconductor Silicon Crystal Technology PDF

Author: Fumio Shimura

Publisher: Elsevier

Published: 2012-12-02

Total Pages: 435

ISBN-13: 0323150489

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Semiconductor Silicon Crystal Technology provides information pertinent to silicon, which is the dominant material in the semiconductor industry. This book discusses the technology of integrated circuits (ICs) in electronic materials manufacturer. Comprised of eight chapters, this book provides an overview of the basic science, silicon materials, IC device fabrication processes, and their interaction for enhancing both the processes and materials. This text then proceeds with a discussion of the atomic structure and bonding mechanisms in order to understand the nature and formation of crystal structures, which are the fundamentals of material science. Other chapters consider the technological crystallography and classify natural crystal morphologies based on observation. The final chapter deals with the interrelationships among silicon material characteristics, circuit design, and IC fabrication in order to ensure the fabrication of very-large-scale-integration/ultra-large-scale-integration circuits. This book is a valuable resource for graduate students, physicists, engineers, materials scientists, and professionals involved in semiconductor industry.

Handbook of Semiconductor Manufacturing Technology

Handbook of Semiconductor Manufacturing Technology PDF

Author: Yoshio Nishi

Publisher: CRC Press

Published: 2017-12-19

Total Pages: 1720

ISBN-13: 1420017667

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Retaining the comprehensive and in-depth approach that cemented the bestselling first edition's place as a standard reference in the field, the Handbook of Semiconductor Manufacturing Technology, Second Edition features new and updated material that keeps it at the vanguard of today's most dynamic and rapidly growing field. Iconic experts Robert Doering and Yoshio Nishi have again assembled a team of the world's leading specialists in every area of semiconductor manufacturing to provide the most reliable, authoritative, and industry-leading information available. Stay Current with the Latest Technologies In addition to updates to nearly every existing chapter, this edition features five entirely new contributions on... Silicon-on-insulator (SOI) materials and devices Supercritical CO2 in semiconductor cleaning Low-κ dielectrics Atomic-layer deposition Damascene copper electroplating Effects of terrestrial radiation on integrated circuits (ICs) Reflecting rapid progress in many areas, several chapters were heavily revised and updated, and in some cases, rewritten to reflect rapid advances in such areas as interconnect technologies, gate dielectrics, photomask fabrication, IC packaging, and 300 mm wafer fabrication. While no book can be up-to-the-minute with the advances in the semiconductor field, the Handbook of Semiconductor Manufacturing Technology keeps the most important data, methods, tools, and techniques close at hand.

Porous Silicon Science and Technology

Porous Silicon Science and Technology PDF

Author: Jean-Claude Vial

Publisher: Springer

Published: 1995-03-20

Total Pages: 0

ISBN-13: 9783540589365

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The discovery of bright visible light emission from porous silicon has opened the door to various nanometer sized silicon structures where the confinement of carriers gives rise to interesting physical properties. While the high efficiency of the light emission in the visible range is the common and the most prominent feature, their structures display similar properties with other highly divided materials (even non semiconductors), and then justify a multidisciplinary approach. This along with potential applications has attracted a large number of researchers followed by students to be trained. Until now international conferences have provided the exchange of information but have remained highly specialised so it was time to give thought to the organisation of topical and advanced lectures where the multidisciplinarity and the didactic approach are paramount. L'ecole des Houches was ideally devoted to that purpose. The meeting : " Luminescence of porous silicon and silicon nanostructures" was the first international school on this topic but some aspects in the organisation and the attendance have given an international workshop flavor to it. The school by itself has trained 82 «students», most of them were students starting their Ph. D thesis. 50% were French citizens and the other represented countries were Germany, England, USA, Czechoslovakia, The Netherlands, Italy, Japan, Poland, Spain, Canada, Brazil, India and Russia.

C, H, N and O in Si and Characterization and Simulation of Materials and Processes

C, H, N and O in Si and Characterization and Simulation of Materials and Processes PDF

Author: A. Borghesi

Publisher: Newnes

Published: 2012-12-02

Total Pages: 580

ISBN-13: 044459633X

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Containing over 200 papers, this volume contains the proceedings of two symposia in the E-MRS series. Part I presents a state of the art review of the topic - Carbon, Hydrogen, Nitrogen and Oxygen in Silicon and in Other Elemental Semiconductors. There was strong representation from the industrial laboratories, illustrating that the topic is highly relevant for the semiconductor industry. The second part of the volume deals with a topic which is undergoing a process of convergence with two concerns that are more particularly application oriented. Firstly, the advanced instrumentation which, through the use of atomic force and tunnel microscopies, high resolution electron microscopy and other high precision analysis instruments, now allows for direct access to atomic mechanisms. Secondly, the technological development which in all areas of applications, particularly in the field of microelectronics and microsystems, requires as a result of the miniaturisation race, a precise mastery of the microscopic mechanisms.

VLSI Fabrication Principles

VLSI Fabrication Principles PDF

Author: Sorab K. Ghandhi

Publisher: John Wiley & Sons

Published: 1994-03-31

Total Pages: 870

ISBN-13: 0471580058

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Fully updated with the latest technologies, this edition covers thefundamental principles underlying fabrication processes forsemiconductor devices along with integrated circuits made fromsilicon and gallium arsenide. Stresses fabrication criteria forsuch circuits as CMOS, bipolar, MOS, FET, etc. These diversetechnologies are introduced separately and then consolidated intocomplete circuits. An Instructor's Manual presenting detailed solutions to all theproblems in the book is available from the Wiley editorialdepartment.

Porous Silicon Science and Technology

Porous Silicon Science and Technology PDF

Author: Jean-Claude Vial

Publisher: Springer

Published: 2013-01-08

Total Pages: 358

ISBN-13: 9783662031216

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The discovery of bright visible light emission from porous silicon has opened the door to various nanometer sized silicon structures where the confinement of carriers gives rise to interesting physical properties. While the high efficiency of the light emission in the visible range is the common and the most prominent feature, their structures display similar properties with other highly divided materials (even non semiconductors), and then justify a multidisciplinary approach. This along with potential applications has attracted a large number of researchers followed by students to be trained. Until now international conferences have provided the exchange of information but have remained highly specialised so it was time to give thought to the organisation of topical and advanced lectures where the multidisciplinarity and the didactic approach are paramount. L'ecole des Houches was ideally devoted to that purpose. The meeting : " Luminescence of porous silicon and silicon nanostructures" was the first international school on this topic but some aspects in the organisation and the attendance have given an international workshop flavor to it. The school by itself has trained 82 «students», most of them were students starting their Ph. D thesis. 50% were French citizens and the other represented countries were Germany, England, USA, Czechoslovakia, The Netherlands, Italy, Japan, Poland, Spain, Canada, Brazil, India and Russia.

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