Plasma Processing XIV
Author: G. S. Mathad
Publisher:
Published: 2002
Total Pages: 342
ISBN-13: 9781566773416
DOWNLOAD EBOOK →Lanterna Rally
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Plasma Processing XIV
Author: G. S. Mathad
Publisher:
Published: 2002-01-01
Total Pages: 324
ISBN-13: 9781566773416
DOWNLOAD EBOOK →Industrial Plasma Engineering
Author: J Reece Roth
Publisher: Routledge
Published: 2017-11-01
Total Pages: 770
ISBN-13: 1351438700
DOWNLOAD EBOOK →Written by a leading expert in the field, the paperback edition of Industrial Plasma Engineering, Volume 2: Applications to Nonthermal Plasma Processing provides a background in the principles and applications of low temperature, partially ionized Lorentzian plasmas that are used industrially. The book also presents a description of plasma-related processes and devices that are of commercial interest. The text is suitable for students or in-service users with a physics and calculus background at the sophomore level. These two volumes are intended to be used as textbooks at the senior or first-year graduate level by students from all engineering and physical science disciplines and as a reference source by in-service engineers.
Energy Research Abstracts
ERDA Energy Research Abstracts
Plasma Processing of Materials
Author: National Research Council
Publisher: National Academies Press
Published: 1991-02-01
Total Pages: 88
ISBN-13: 0309045975
DOWNLOAD EBOOK →Plasma processing of materials is a critical technology to several of the largest manufacturing industries in the worldâ€"electronics, aerospace, automotive, steel, biomedical, and toxic waste management. This book describes the relationship between plasma processes and the many industrial applications, examines in detail plasma processing in the electronics industry, highlights the scientific foundation underlying this technology, and discusses education issues in this multidisciplinary field. The committee recommends a coordinated, focused, and well-funded research program in this area that involves the university, federal laboratory, and industrial sectors of the community. It also points out that because plasma processing is an integral part of the infrastructure of so many American industries, it is important for both the economy and the national security that America maintain a strong leadership role in this technology.
Thin film transistors. 1. Amorphous silicon thin film transistors
Author: Yue Kuo
Publisher: Springer Science & Business Media
Published: 2004
Total Pages: 538
ISBN-13: 9781402075056
DOWNLOAD EBOOK →This is the first reference on amorphous silicon and polycrystalline silicon thin film transistors that gives a systematic global review of all major topics in the field. These volumes include sections on basic materials and substrates properties, fundamental device physics, critical fabrication processes (structures, a-Si: H, dielectric, metallization, catalytic CVD), and existing and new applications. The chapters are written by leading researchers who have extensive experience with reputed track records. Thin Film Transistors provides practical information on preparing individual functional a-Si: H TFTs and poly-Si TFTs as well as large-area TFT arrays. Also covered are basic theories on the a-Si: H TFT operations and unique material characteristics. Readers are also exposed to a wide range of existing and new applications in industries.
Plasma Processing
Advances in Neural Networks - ISNN 2006
Author: Jun Wang
Publisher: Springer Science & Business Media
Published: 2006-05-11
Total Pages: 1429
ISBN-13: 3540344829
DOWNLOAD EBOOK →This is Volume III of a three volume set constituting the refereed proceedings of the Third International Symposium on Neural Networks, ISNN 2006. 616 revised papers are organized in topical sections on neurobiological analysis, theoretical analysis, neurodynamic optimization, learning algorithms, model design, kernel methods, data preprocessing, pattern classification, computer vision, image and signal processing, system modeling, robotic systems, transportation systems, communication networks, information security, fault detection, financial analysis, bioinformatics, biomedical and industrial applications, and more.
Plasma Processing 17
Author: G. Mathad
Publisher: The Electrochemical Society
Published: 2008-11
Total Pages: 89
ISBN-13: 1566776651
DOWNLOAD EBOOK →This issue of ECS Transactions contains papers presented at the International Symposium on Plasma Processing. The symposium, 17th in the series, cosponsored by the Dielectric Science & Technology, Electronics, and Photonics Divisions was held as part of the 213th Meeting of The Electrochemical Society, Inc., in Phoenix, AZ, USA, May 18 - 23, 2008. A total of 14 papers were presented from Belgium, Germany, Italy, Japan, Republic of Korea, Russia, and the USA on topics mainly focused on diagnostics & measurements and etching & deposition processes.
