Proceedings of the Symposium on Electron and Ion Beam Science and Technology
Author: Robert Bakish
Publisher: The Electrochemical Society
Published: 1976
Total Pages: 644
ISBN-13:
DOWNLOAD EBOOK →Lanterna Rally
eBook PDF Download Digital Library
Proceedings of the Symposium on Electron and Ion Beam Science and Technology
Focused Ion Beam Systems
Author: Nan Yao
Publisher: Cambridge University Press
Published: 2007-09-13
Total Pages: 496
ISBN-13: 1107320569
DOWNLOAD EBOOK →The focused ion beam (FIB) system is an important tool for understanding and manipulating the structure of materials at the nanoscale. Combining this system with an electron beam creates a DualBeam - a single system that can function as an imaging, analytical and sample modification tool. Presenting the principles, capabilities, challenges and applications of the FIB technique, this edited volume, first published in 2007, comprehensively covers the ion beam technology including the DualBeam. The basic principles of ion beam and two-beam systems, their interaction with materials, etching and deposition are all covered, as well as in situ materials characterization, sample preparation, three-dimensional reconstruction and applications in biomaterials and nanotechnology. With nanostructured materials becoming increasingly important in micromechanical, electronic and magnetic devices, this self-contained review of the range of ion beam methods, their advantages, and when best to implement them is a valuable resource for researchers in materials science, electrical engineering and nanotechnology.
Nanofabrication Using Focused Ion and Electron Beams
Author: Ivo Utke
Publisher: OUP USA
Published: 2012-05
Total Pages: 830
ISBN-13: 0199734216
DOWNLOAD EBOOK →This book comprehensively reviews the achievements and potentials of a minimally invasive, three-dimensional, and maskless surface structuring technique operating at nanometer scale by using the interaction of focused ion and electron beams (FIB/FEB) with surfaces and injected molecules.
Ion Beam Technology and Applications
Author: Ozan Artun
Publisher: BoD – Books on Demand
Published: 2023-11-22
Total Pages: 112
ISBN-13: 1837691088
DOWNLOAD EBOOK →The scientific and commercial purposes of ion beams are remarkable in many fields because ion beam technology is a primary tool that provides a wide range of applications in science, medicine, space, and engineering. This book presents theoretical and experimental knowledge about ion beam applications and technology. It includes six chapters that address such topics as the interaction of ion beams with matter, the evaluation of nuclear material damage, surface microstructure changes, oblique Ar+ sputtered SiC thin films, electron beam processing, and ribbon ion beams.
First International Conference on Electron and Ion Beam Science and Technology
Author: Electrochemical Society (New York, City of). - Electrothermics and Metallurgy Division
Publisher:
Published: 1965
Total Pages: 970
ISBN-13:
DOWNLOAD EBOOK →Ion Beam Applications
Author: Ishaq Ahmad
Publisher: BoD – Books on Demand
Published: 2018-07-18
Total Pages: 190
ISBN-13: 178923414X
DOWNLOAD EBOOK →Ion beam of various energies is a standard research tool in many areas of science, from basic physics to diverse areas in space science and technology, device fabrications, materials science, environment science, and medical sciences. It is an advance and versatile tool to frequently discover applications across a broad range of disciplines and fields. Moreover, scientists are continuously improving the ion beam sources and accelerators to explore ion beam at the forefront of scientific endeavours. This book provides a glance view on MeV ion beam applications, focused ion beam generation and its applications as well as practical applications of ion implantation.
An Assessment of U.S.-Based Electron-Ion Collider Science
Author: National Academies of Sciences, Engineering, and Medicine
Publisher: National Academies Press
Published: 2018-10-13
Total Pages: 153
ISBN-13: 0309478561
DOWNLOAD EBOOK →Understanding of protons and neutrons, or "nucleons"â€"the building blocks of atomic nucleiâ€"has advanced dramatically, both theoretically and experimentally, in the past half century. A central goal of modern nuclear physics is to understand the structure of the proton and neutron directly from the dynamics of their quarks and gluons governed by the theory of their interactions, quantum chromodynamics (QCD), and how nuclear interactions between protons and neutrons emerge from these dynamics. With deeper understanding of the quark-gluon structure of matter, scientists are poised to reach a deeper picture of these building blocks, and atomic nuclei themselves, as collective many-body systems with new emergent behavior. The development of a U.S. domestic electron-ion collider (EIC) facility has the potential to answer questions that are central to completing an understanding of atoms and integral to the agenda of nuclear physics today. This study assesses the merits and significance of the science that could be addressed by an EIC, and its importance to nuclear physics in particular and to the physical sciences in general. It evaluates the significance of the science that would be enabled by the construction of an EIC, its benefits to U.S. leadership in nuclear physics, and the benefits to other fields of science of a U.S.-based EIC.
Electron-Beam Technology in Microelectronic Fabrication
Author: George Brewer
Publisher: Elsevier
Published: 2012-12-02
Total Pages: 377
ISBN-13: 0323153410
DOWNLOAD EBOOK →Electron-Beam Technology in Microelectronic Fabrication presents a unified description of the technology of high resolution lithography. This book is organized into six chapters, each treating a major segment of the technology of high resolution lithography. The book examines topics such as the physics of interaction of the electrons with the polymer resist in which the patterns are drawn, the machines that generate and control the beam, and ways of applying electron-beam lithography in device fabrication and in the making of masks for photolithographic replication. Chapter 2 discusses fundamental processes by which patterns are created in resist masks. Chapter 3 describes electron-beam lithography machines, including some details of each of the major elements in the electron-optical column and their effect on the focused electron beam. Chapter 4 presents the use of electron-beam lithography to make discrete devices and integrated circuits. Chapter 5 looks at the techniques and economics of mask fabrication by the use of electron beams. Finally, Chapter 6 presents a comprehensive description and evaluation of the several high resolution replication processes currently under development. This book will be of great value to students and to engineers who want to learn the unique features of high resolution lithography so that they can apply it in research, development, or production of the next generation of microelectronic devices and circuits.
Intense Electron and Ion Beams
Author: Sergey Ivanovich Molokovsky
Publisher: Springer Science & Business Media
Published: 2005-11-28
Total Pages: 285
ISBN-13: 3540288120
DOWNLOAD EBOOK →Intense Ion and Electron Beams treats intense charged-particle beams used in vacuum tubes, particle beam technology and experimental installations such as free electron lasers and accelerators. It addresses, among other things, the physics and basic theory of intense charged-particle beams; computation and design of charged-particle guns and focusing systems; multiple-beam charged-particle systems; and experimental methods for investigating intense particle beams. The coverage is carefully balanced between the physics of intense charged-particle beams and the design of optical systems for their formation and focusing. It can be recommended to all scientists studying or applying vacuum electronics and charged-particle beam technology, including students, engineers, and researchers.
