Efficient Extreme Ultraviolet Mirror Design

Efficient Extreme Ultraviolet Mirror Design PDF

Author: Yen-Min Lee

Publisher:

Published: 2021

Total Pages: 0

ISBN-13: 9780750326520

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Extreme ultraviolet (EUV) lithography is a next generation platform with the potential to extend Moore's Law. The EUV mirror is a fundamental component of this system. Efficient Extreme Ultraviolet Mirror Design describes an approach to designing EUV mirrors with reduced computational time and memory requirements, providing a comprehensive grounding in the fundamentals of the EUV mirror and knowledge of the finite-difference time-domain (FDTD) method. The discussion is made timely by the opening of commercial avenues for the application of EUV as it begins to be implemented in the development of 5G, AI, edge computing, VR and the Internet of Things. This book explores the theory, function and fabrication of EUV mirrors, as well as the correlation between design by Fresnel's equations and design by photonic bands, and develops a rigorous and efficient FDTD method by applying these considerations to three simulation cases. Intended primarily for EUV industry professionals, Efficient Extreme Ultraviolet Mirror Design will be of particular use to researchers investigating large scale problems or near-field scattering problems in EUV lithography. It will serve as an excellent reference text for anyone working in or studying optical engineering, as well as a high-level introduction for researchers from other fields interested in photolithography and the FDTD method.

Optical Design

Optical Design PDF

Author: Greggory Scranton

Publisher:

Published: 2017

Total Pages: 72

ISBN-13:

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As optics and photonics technologies advance, more energy efficient use of light will be necessary. This dissertation presents methods developed to enhance the efficiency of three different optical systems: extreme ultraviolet lithography, a hybrid solar photovoltaic/thermal collection system, and thermo-photovoltaics. Extreme ultraviolet (EUV) lithography is the leading contender to become the next industrial scale lithography technology in the semiconductor industry. Traditionally, aberration correction in extreme ultraviolet projection optics requires the use of multiple lossy mirrors, which results in prohibitively high source power requirements. This dissertation analyzes a single spherical mirror projection optical system where aberration correction is built into the mask itself through an adjoint-based optimization algorithm. This greatly reduces the power requirements for the source. Hybrid solar photovoltaic/thermal systems offer a way to convert sunlight into electricity and heat that efficiently uses different parts of the solar spectrum. Highly efficient hybrid solar photovoltaic/thermal systems are enabled by recent advances in photovoltaic technology. Record breaking photovoltaic cells have highly reflective rear mirrors to maximize luminescence efficiency. This reflectivity can also be used to create reflective optics to concentrate the reflected radiation onto a thermal absorber. This dissertation reports on a hybrid solar photovoltaic/thermal system with a thermal efficiency of 37% at a maximum absorber temperature of 365°C, and a direct solar to electric efficiency of 8%. Thermo-photovoltaics offers a method to use photovoltaic cells to efficiently convert heat to electricity. In a thermo-photovoltaic system, light is collected by photovoltaic cells from a local black body source. This dissertation reports on a thermo-photovoltaic device that recycles unused radiation from the photovoltaics with a highly reflective rear mirror. Theoretical efficiencies using this strategy are in excess of 50%. For an emitter temperature of 1207°C, this dissertation reports an experimental power conversion efficiency of 28.1%.

Design, Fabrication, and Characterization of High-efficiency Extreme Ultraviolet Diffusers

Design, Fabrication, and Characterization of High-efficiency Extreme Ultraviolet Diffusers PDF

Author:

Publisher:

Published: 2004

Total Pages: 27

ISBN-13:

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As the development of extreme ultraviolet (EUV) lithography progresses, interest grows in the extension of traditional optical components to the EUV regime. The strong absorption of EUV by most materials and its extremely short wavelength, however, makes it very difficult to implement many components that are commonplace in the longer wavelength regimes. One such example is the diffuser often implemented with ordinary ground glass in the visible light regime. Here we demonstrate the fabrication of reflective EUV diffusers with high efficiency within a controllable bandwidth. Using these techniques we have fabricated diffusers with efficiencies exceeding 10% within a moderate angular single-sided bandwidth of approximately 0.06 radians.

Extreme Ultraviolet Astronomy

Extreme Ultraviolet Astronomy PDF

Author: Martin A. Barstow

Publisher: Cambridge University Press

Published: 2003-03-13

Total Pages: 412

ISBN-13: 1139435124

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This book describes the development of astronomy in the Extreme Ultraviolet wavelength range, from the first rocket-based experiments to later satellite missions. It will be of great value to graduate students and researchers.

Optical Technologies for Extreme-Ultraviolet and Soft X-ray Coherent Sources

Optical Technologies for Extreme-Ultraviolet and Soft X-ray Coherent Sources PDF

Author: Federico Canova

Publisher: Springer

Published: 2015-08-17

Total Pages: 205

ISBN-13: 3662474433

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The book reviews the most recent achievements in optical technologies for XUV and X-ray coherent sources. Particular attention is given to free-electron-laser facilities, but also to other sources available at present, such as synchrotrons, high-order laser harmonics and X-ray lasers. The optical technologies relevant to each type of source are discussed. In addition, the main technologies used for photon handling and conditioning, namely multilayer mirrors, adaptive optics, crystals and gratings are explained. Experiments using coherent light received during the last decades a lot of attention for the X-ray regime. Strong efforts were taken for the realization of almost fully coherent sources, e.g. the free-electron lasers, both as independent sources in the femtosecond and attosecond regimes and as seeding sources for free-electron-lasers and X-ray gas lasers. In parallel to the development of sources, optical technologies for photon handling and conditioning of such coherent and intense X-ray beams advanced. New problems were faced for the realization of optical components of beamlines demanding to manage coherent X-ray photons, e.g. the preservation of coherence and time structure of ultra short pulses.

Enhancement Cavities for the Generation of Extreme Ultraviolet and Hard X-Ray Radiation

Enhancement Cavities for the Generation of Extreme Ultraviolet and Hard X-Ray Radiation PDF

Author: Henning Carstens

Publisher: Springer

Published: 2018-06-22

Total Pages: 92

ISBN-13: 3319940090

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This thesis discusses the power scaling of ultrashort pulses in enhancement cavities, utilized in particular for frequency conversion processes, such as Thomson scattering and high-harmonic generation. Using custom optics for ultrashort-pulse enhancement cavities, it demonstrates for the first time that at the envisaged power levels, the mitigation of thermal effects becomes indispensable even in cavities comprising solely reflective optics. It also studies cavities with large beams, albeit with low misalignment sensitivity, as a way to circumvent intensity-induced mirror damage. Average powers of several hundred kilowatts are demonstrated, which benefit hard x-ray sources based on Thomson scattering. Furthermore, pulses as short as 30 fs were obtained at more than 10 kW of average power and employed for high-harmonic generation with photon energies exceeding 100 eV at 250 MHz repetition rate, paving the way for frequency comb spectroscopy in this spectral region.

Plasma Processing of Nanomaterials

Plasma Processing of Nanomaterials PDF

Author: R. Mohan Sankaran

Publisher: CRC Press

Published: 2017-12-19

Total Pages: 432

ISBN-13: 1439866775

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We are at a critical evolutionary juncture in the research and development of low-temperature plasmas, which have become essential to synthesizing and processing vital nanoscale materials. More and more industries are increasingly dependent on plasma technology to develop integrated small-scale devices, but physical limits to growth, and other challenges, threaten progress. Plasma Processing of Nanomaterials is an in-depth guide to the art and science of plasma-based chemical processes used to synthesize, process, and modify various classes of nanoscale materials such as nanoparticles, carbon nanotubes, and semiconductor nanowires. Plasma technology enables a wide range of academic and industrial applications in fields including electronics, textiles, automotives, aerospace, and biomedical. A prime example is the semiconductor industry, in which engineers revolutionized microelectronics by using plasmas to deposit and etch thin films and fabricate integrated circuits. An overview of progress and future potential in plasma processing, this reference illustrates key experimental and theoretical aspects by presenting practical examples of: Nanoscale etching/deposition of thin films Catalytic growth of carbon nanotubes and semiconductor nanowires Silicon nanoparticle synthesis Functionalization of carbon nanotubes Self-organized nanostructures Significant advances are expected in nanoelectronics, photovoltaics, and other emerging fields as plasma technology is further optimized to improve the implementation of nanomaterials with well-defined size, shape, and composition. Moving away from the usual focus on wet techniques embraced in chemistry and physics, the author sheds light on pivotal breakthroughs being made by the smaller plasma community. Written for a diverse audience working in fields ranging from nanoelectronics and energy sensors to catalysis and nanomedicine, this resource will help readers improve development and application of nanomaterials in their own work. About the Author: R. Mohan Sankaran received the American Vacuum Society’s 2011 Peter Mark Memorial Award for his outstanding contributions to tandem plasma synthesis.

Multifacet, Metal Mirror Design for Extreme-Ultraviolet and Soft X-Ray Free-Electron Laser Resonators

Multifacet, Metal Mirror Design for Extreme-Ultraviolet and Soft X-Ray Free-Electron Laser Resonators PDF

Author: BE. Newnam

Publisher:

Published: 1988

Total Pages: 9

ISBN-13:

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Resonator mirrors with reflectance greater than ~40% are required if free-electron laser (FEL) oscillators are to be extended to wavelengths below 100 nm. The principle of total-external reflection has been used to design multifacet mirrors of several metal films that surpass this requirement between 10 and 100 nm. These reflectors have high reflectance over a relatively broad band which suits well the inherent FEL wavelength tunability. The practical limitations to achieving and maintaining high reflectance include oxide- and carbon-contamination, scattering, and surface-plasmon absorption.

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