Control of Semiconductor Surfaces and Interfaces: Volume 448

Control of Semiconductor Surfaces and Interfaces: Volume 448 PDF

Author: S. K. Brierley

Publisher: Materials Research Society

Published: 1997-07-15

Total Pages: 0

ISBN-13: 9781558993525

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Semiconductor surfaces and interfaces play a vital role in modern-day electronic devices. This is especially true as device dimensions shrink. The properties of clean surfaces and chemically processed surfaces can also have a significant impact on the properties of subsequently grown layers. These surfaces and interfaces may exhibit modified structural, electronic and optical properties, so it is important to understand their effects on subsequent growth, processing and device fabrication. Topics in the book include: structure of surfaces; control of surface defects and properties through chemical etching and passivation; modification of surfaces for growth and processing; nucleation on semiconductor surfaces and self-assembly; the effects of surfaces and interfaces on subsequent growth; and the properties of semiconductor/dielectric and semiconductor/ metal interfaces. In situ and ex situ monitoring of these properties, using various electrical and optical techniques are also presented.

Atomic Resolution Microscopy of Surfaces and Interfaces: Volume 466

Atomic Resolution Microscopy of Surfaces and Interfaces: Volume 466 PDF

Author: David J. Smith

Publisher:

Published: 1997-09-05

Total Pages: 302

ISBN-13:

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There has been a considerable expansion in the breadth and depth of studies involving scanning tunneling microscopy and high-resolution electron microscopy. The purpose of this book is to highlight recent developments and applications of atomic-resolution imaging methods to surfaces and bulk defects. Papers from a range of scientific and engineering disciplines are presented. Recent advances in imaging techniques, including quantitative image matching, are emphasized. Applications to ceramics, intermetallics and semiconductor surface reconstructions are also featured.

Structure and Evolution of Surfaces: Volume 440

Structure and Evolution of Surfaces: Volume 440 PDF

Author: Robert C. Cammarata

Publisher:

Published: 1997-11-13

Total Pages: 536

ISBN-13:

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This book brings together an interdisciplinary group of surface physicists, chemists and materials scientists to present the most current advances in the area of surface science. Both scientific and technological issues are addressed. Topics include: surface and step structure; morphology, roughness and instabilities; kinetic processes; nucleation on surfaces and interfaces; mechanics of surfaces; self-assembled and Langmuir-Blodgett films; thin-film surfaces and growth; chemistry and modification of surfaces and metal-semiconductor interfaces.

Science and Technology of Semiconductor Surface Preparation: Volume 477

Science and Technology of Semiconductor Surface Preparation: Volume 477 PDF

Author: Gregg S. Hagashi

Publisher:

Published: 1997-09-30

Total Pages: 576

ISBN-13:

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The focus of semiconductor wafer processing is rapidly changing. Pure device performance is no longer sufficient to ensure a technology's success as IC chips approach 1GB. Yield, reliability, cost and manufacturability are principal drivers of the industry. Great strides have been made in understanding the science and impact of front-end (pre-metal) chemical surface preparations and are beginning to influence the 'real' technology and its evolution. Efforts in understanding particle and metals removal, along with Si surface etching and microroughness are prime examples of areas where work is beginning to pay off together with processes related to the back-end (post-metal). The focus of this book is to report new findings and to discuss surface preparation with an emphasis on gaining a mechanistic understanding of the underlying science upon which the technology is based. Topics include: megasonic cleaning; SC1 technology; surface preparation and gate oxide reliability; CMP/CMP cleaning; post-etch processing; surface microroughness; wet chemical cleaning and gate oxide integrity; analytical studies of surfaces; wet chemical cleaning/etching; dry wafer cleaning; and environmentally friendly processing.

Infrared Applications of Semiconductors: Volume 450

Infrared Applications of Semiconductors: Volume 450 PDF

Author: M. Omar Manasreh

Publisher:

Published: 1997-03-17

Total Pages: 512

ISBN-13:

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This book is unique in that it combines for the first time the infrared detectors and infrared lasers and emitters in one volume. It is merely a step, however, in a very fast-changing field, toward achieving an understanding of novel structures that can be used for high-performance infrared detectors, imaging arrays, infrared lasers and sources. Internationally-known experts discuss recent advances in materials structures, processing and device performances, with presentations crossing materials and discipline boundaries. Recent investigations based on III-V, II-VI and IV bulk semiconductors, quantum wells, and superlattices for long-wavelength infrared detectors, emitters, sources and materials are featured. Topics include: antimonide-related materials and devices; quantum wells and devices; quantum infrared detectors; HgCdTe - materials, devices and processing; nonlinear and parametric oscillator material; interdiffusion in heterostructures and related topics.

Scientific Basis for Nuclear Waste Management XX: Volume 465

Scientific Basis for Nuclear Waste Management XX: Volume 465 PDF

Author: Walter J. Gray

Publisher:

Published: 1997-07

Total Pages: 1398

ISBN-13:

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This book features scientific research that supports the safe and effective disposal of radioactive waste in a geological repository. One highlight of the volume is the opening talk by Rustum Roy, who was instrumental in establishing the first symposium on this topic in 1978. Professor Roy summarizes his views of the past 19 years of progress in the field. A second highlight is the participation by several Russian and Ukrainian scientists who authored papers on nuclear waste disposal aspects of the Chernobyl Unit 4 reactor that exploded in April 1986. Additional topics include: glass formulations and properties; glass/water interactions; cements in radioactive waste management; ceramic and crystalline waste forms; spent nuclear fuel; waste processing and treatment; radiation effects in ceramics, glasses and nuclear waste materials; waste package materials; radionuclide solubility and speciation; radionuclide sorption; radionuclide transport; repository backfill; performance assessment; natural analogues and excess plutonium dispositioning.

Gallium Nitride and Related Materials II: Volume 468

Gallium Nitride and Related Materials II: Volume 468 PDF

Author: C. R. Abernathy

Publisher: Materials Research Society

Published: 1997-08-13

Total Pages: 534

ISBN-13: 9781558993723

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This book from MRS dedicated to III-Nitrides, focuses on developments in AlN, GaN, InN and their alloys that are now finding application in short-wavelength lasers (~400nm, cw at room temperature) and high-power electronics (2.8W/mm at GHz). Experts from fields including crystal growth, condensed matter theory, source chemistry, device processing and device design come together in the volume to address issues of both scientific and technological relevance. And while much of the book reports on advances in material preparation and the understanding of defect issues, similar advances in material and device processing are also reported. Topics include: growth and doping; substrates and substrate effects; characterization; processing and device performance and design.

Low-Dielectric Constant Materials II: Volume 443

Low-Dielectric Constant Materials II: Volume 443 PDF

Author: André Lagendijk

Publisher:

Published: 1997-08-19

Total Pages: 224

ISBN-13:

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Low-dielectric constant materials are needed to improve the performance and speed of future integrated circuits. In fact, the diversity of contributors to this book is testimony to the global significance of the topic to the future of semiconductor manufacturing. Presentations include those by semiconductor equipment manufacturers and chemical source suppliers, academia from six countries, four government laboratories and five major device manufacturers. Approaches to designing and implementing reduction in dielectric constant for intermetal dielectric materials are featured and range from the evolution of silicon dioxide to fluorinated silicate glass, to the use of inorganic/organic polymers and spin-on-material, to fluorinated diamond-like carbon and nanoporous silica. The book also addresses the practical aspects of the use of low-dielectric constant materials such as chemical mechanical polishing of these materials and optimization of wiring delays in devices utilizing low-k material.

Statistical Mechanics in Physics and Biology: Volume 463

Statistical Mechanics in Physics and Biology: Volume 463 PDF

Author: Denis Wirtz

Publisher:

Published: 1997

Total Pages: 360

ISBN-13:

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Since statistical physics is a tool for the study not only of disordered physical systems, but of biological systems as well, this book from MRS focuses on both. While including physical problems such as fractals, pattern formation at first-order phase transitions, and glassy dynamics, the book also focuses on problems such as the statistical mechanics of DNA and DNA replications, structuring in biological systems, and problems in 'biologically inspired physics'. Topics include: statistical mechanics of proteins; statistical mechanics of DNA; biologically inspired physics; statistical mechanics in biology; micromanipulation in physics and biology; friction and fracture; statistical mechanics in physics and granular media.