Chemistry and Lithography

Chemistry and Lithography PDF

Author: Uzodinma Okoroanyanwu

Publisher: SPIE Press

Published: 2011-03-08

Total Pages: 0

ISBN-13: 9781118030028

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Chemistry and Lithography provides a comprehensive treatment of the chemical phenomena in lithography in a manner that is accessible to a wide readership. The book presents topics on the optical and charged particle physics practiced in lithography, with a broader view of how the marriage between chemistry and optics has made possible the print and electronic revolutions of the digital age. The related aspects of lithography are thematically presented to convey a unified view of the developments in the field over time, from the very first recorded reflections on the nature of matter to the latest developments at the frontiers of lithography science and technology. Part I presents several important chemical and physical principles involved in the invention and evolution of lithography. Part II covers the processes for the synthesis, manufacture, usage, and handling of lithographic chemicals and materials. Part III investigates several important chemical and physical principles involved in the practice of lithography. Chemistry and Lithography is a useful reference for anyone working in the semiconductor industry.

The Chemical History of Lithography

The Chemical History of Lithography PDF

Author: Uzodinma Okoroanyanwu

Publisher:

Published: 2020

Total Pages: 274

ISBN-13: 9781510631564

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"This volume is the first in a series of three books that make up the second edition of Chemistry and Lithography, which is continued in volume 2 (Chemistry in Lithography) and volume 3 (The Practice of Lithography). Each volume is a unit in itself and can stand alone, which is fortunate in view of their different subject matters. Volume 1 of the present edition weaves together threads of a narrative on the history of optical and molecular physics, optical technology, chemistry, and lithography, with a view to creating a rich tapestry that gives the reader new insights into an aspect of the relationships between these fields that are often not fully appreciated: how the marriage between chemistry and optics led to the development and evolution of lithography. We show how major developments in chemistry, physics and technology of light influenced the invention and development of lithography, well beyond what its inventor envisioned. We also show how developments in lithography have not only influenced the development of optics and chemistry, but also played a critical role in the large scale manufacture of integrated circuits that run the computers and machineries on which our modern electronic and information age depend. Part of the analysis in this volume is necessarily skewed towards the underlying science and technologies of advanced lithographic patterning techniques, in terms of materials, processes, imaging, along with their unique features, strengths and limitations. This book also provides an analysis of the emerging trends in lithographic patterning, along with the current and potential applications of the resulting patterned structures and surfaces"--

Chemistry and Lithography: The chemical history of lithography

Chemistry and Lithography: The chemical history of lithography PDF

Author: Uzodinma Okoroanyanwu

Publisher:

Published: 2020

Total Pages:

ISBN-13: 9781510631557

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"This volume is the first in a series of three books that make up the second edition of Chemistry and Lithography, which is continued in volume 2 (Chemistry in Lithography) and volume 3 (The Practice of Lithography). Each volume is a unit in itself and can stand alone, which is fortunate in view of their different subject matters. Volume 1 of the present edition weaves together threads of a narrative on the history of optical and molecular physics, optical technology, chemistry, and lithography, with a view to creating a rich tapestry that gives the reader new insights into an aspect of the relationships between these fields that are often not fully appreciated: how the marriage between chemistry and optics led to the development and evolution of lithography. We show how major developments in chemistry, physics and technology of light influenced the invention and development of lithography, well beyond what its inventor envisioned. We also show how developments in lithography have not only influenced the development of optics and chemistry, but also played a critical role in the large scale manufacture of integrated circuits that run the computers and machineries on which our modern electronic and information age depend. Part of the analysis in this volume is necessarily skewed towards the underlying science and technologies of advanced lithographic patterning techniques, in terms of materials, processes, imaging, along with their unique features, strengths and limitations. This book also provides an analysis of the emerging trends in lithographic patterning, along with the current and potential applications of the resulting patterned structures and surfaces"--

Fundamental Principles of Optical Lithography

Fundamental Principles of Optical Lithography PDF

Author: Chris Mack

Publisher: John Wiley & Sons

Published: 2011-08-10

Total Pages: 503

ISBN-13: 1119965071

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The fabrication of an integrated circuit requires a variety of physical and chemical processes to be performed on a semiconductor substrate. In general, these processes fall into three categories: film deposition, patterning, and semiconductor doping. Films of both conductors and insulators are used to connect and isolate transistors and their components. By creating structures of these various components millions of transistors can be built and wired together to form the complex circuitry of modern microelectronic devices. Fundamental to all of these processes is lithography, ie, the formation of three-dimensional relief images on the substrate for subsequent transfer of the pattern to the substrate. This book presents a complete theoretical and practical treatment of the topic of lithography for both students and researchers. It comprises ten detailed chapters plus three appendices with problems provided at the end of each chapter. Additional Information: Visiting http://www.lithoguru.com/textbook/index.html enhances the reader's understanding as the website supplies information on how you can download a free laboratory manual, Optical Lithography Modelling with MATLAB®, to accompany the textbook. You can also contact the author and find help for instructors.

Principles of Lithography

Principles of Lithography PDF

Author: Harry J. Levinson

Publisher: SPIE Press

Published: 2005

Total Pages: 446

ISBN-13: 9780819456601

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Lithography is a field in which advances proceed at a swift pace. This book was written to address several needs, and the revisions for the second edition were made with those original objectives in mind. Many new topics have been included in this text commensurate with the progress that has taken place during the past few years, and several subjects are discussed in more detail. This book is intended to serve as an introduction to the science of microlithography for people who are unfamiliar with the subject. Topics directly related to the tools used to manufacture integrated circuits are addressed in depth, including such topics as overlay, the stages of exposure, tools, and light sources. This text also contains numerous references for students who want to investigate particular topics in more detail, and they provide the experienced lithographer with lists of references by topic as well. It is expected that the reader of this book will have a foundation in basic physics and chemistry. No topics will require knowledge of mathematics beyond elementary calculus.

Materials and Processes for Next Generation Lithography

Materials and Processes for Next Generation Lithography PDF

Author:

Publisher: Elsevier

Published: 2016-11-08

Total Pages: 636

ISBN-13: 0081003587

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As the requirements of the semiconductor industry have become more demanding in terms of resolution and speed it has been necessary to push photoresist materials far beyond the capabilities previously envisioned. Currently there is significant worldwide research effort in to so called Next Generation Lithography techniques such as EUV lithography and multibeam electron beam lithography. These developments in both the industrial and the academic lithography arenas have led to the proliferation of numerous novel approaches to resist chemistry and ingenious extensions of traditional photopolymers. Currently most texts in this area focus on either lithography with perhaps one or two chapters on resists, or on traditional resist materials with relatively little consideration of new approaches. This book therefore aims to bring together the worlds foremost resist development scientists from the various community to produce in one place a definitive description of the many approaches to lithography fabrication. Assembles up-to-date information from the world’s premier resist chemists and technique development lithographers on the properties and capabilities of the wide range of resist materials currently under investigation Includes information on processing and metrology techniques Brings together multiple approaches to litho pattern recording from academia and industry in one place

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