Atomic Layer Deposition of Nanostructured Materials

Atomic Layer Deposition of Nanostructured Materials PDF

Author: Nicola Pinna

Publisher: John Wiley & Sons

Published: 2012-09-19

Total Pages: 463

ISBN-13: 3527639926

DOWNLOAD EBOOK →

Atomic layer deposition, formerly called atomic layer epitaxy, was developed in the 1970s to meet the needs of producing high-quality, large-area fl at displays with perfect structure and process controllability. Nowadays, creating nanomaterials and producing nanostructures with structural perfection is an important goal for many applications in nanotechnology. As ALD is one of the important techniques which offers good control over the surface structures created, it is more and more in the focus of scientists. The book is structured in such a way to fi t both the need of the expert reader (due to the systematic presentation of the results at the forefront of the technique and their applications) and the ones of students and newcomers to the fi eld (through the first part detailing the basic aspects of the technique). This book is a must-have for all Materials Scientists, Surface Chemists, Physicists, and Scientists in the Semiconductor Industry.

Growth and Transport in Nanostructured Materials

Growth and Transport in Nanostructured Materials PDF

Author: Angel Yanguas-Gil

Publisher: Springer

Published: 2016-11-30

Total Pages: 128

ISBN-13: 3319246720

DOWNLOAD EBOOK →

This book will address the application of gas phase thin film methods, including techniques such as evaporation, sputtering, CVD, and ALD to the synthesis of materials on nanostructured and high aspect-ratio high surface area materials. We have chosen to introduce these topics and the different application fields from a chronological perspective: we start with the early concepts of step coverage and later conformality in semiconductor manufacturing, and how later on the range of application branched out to include others such as energy storage, catalysis, and more broadly nanomaterials synthesis. The book will describe the ballistic and continuum descriptions of gas transport on nanostructured materials and then will move on to incorporate the impact of precursor-surface interaction. We will finally conclude approaching the subjects of feature shape evolution and the connection between nano and reactor scales and will briefly present different advanced algorithms that can be used to effectively compute particle transport, in some cases borrowing from other disciplines such as radiative heat transfer. The book gathers in a single place information scattered over thirty years of scientific research, including the most recent results in the field of Atomic Layer Deposition. Besides a mathematical description of the fundamentals of thin film growth in nanostructured materials, it includes analytic expressions and plots that can be used to predict the growth using gas phase synthesis methods in a number of ideal approximations. The focus on the fundamental aspects over particular processes will broaden the appeal and the shelf lifetime of this book. The reader of this book will gain a thorough understanding on the coating of high surface area and nanostructured materials using gas phase thin film deposition methods, including the limitations of each technique. Those coming from the theoretical side will gain the knowledge required to model the growth process, while those readers more interested in the process development will gain the theoretical understanding will be useful for process optimization.

Atomic Layer Deposition

Atomic Layer Deposition PDF

Author: Tommi Kääriäinen

Publisher: John Wiley & Sons

Published: 2013-05-28

Total Pages: 274

ISBN-13: 1118062779

DOWNLOAD EBOOK →

Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.

Atomic Layer Deposition in Energy Conversion Applications

Atomic Layer Deposition in Energy Conversion Applications PDF

Author: Julien Bachmann

Publisher: John Wiley & Sons

Published: 2017-05-30

Total Pages: 308

ISBN-13: 3527339124

DOWNLOAD EBOOK →

Combining the two topics for the first time, this book begins with an introduction to the recent challenges in energy conversion devices from a materials preparation perspective and how they can be overcome by using atomic layer deposition (ALD). By bridging these subjects it helps ALD specialists to understand the requirements within the energy conversion field, and researchers in energy conversion to become acquainted with the opportunities offered by ALD. With its main focus on applications of ALD for photovoltaics, electrochemical energy storage, and photo- and electrochemical devices, this is important reading for materials scientists, surface chemists, electrochemists, electrotechnicians, physicists, and those working in the semiconductor industry.

Advanced Nano Deposition Methods

Advanced Nano Deposition Methods PDF

Author: Yuan Lin

Publisher: John Wiley & Sons

Published: 2016-08-29

Total Pages: 328

ISBN-13: 3527696458

DOWNLOAD EBOOK →

This concise reference summarizes the latest results in nano-structured thin films, the first to discuss both deposition methods and electronic applications in detail. Following an introduction to this rapidly developing field, the authors present a variety of organic and inorganic materials along with new deposition techniques, and conclude with an overview of applications and considerations for their technology deployment.

Atomic Layer Deposition of Nanostructured Materials

Atomic Layer Deposition of Nanostructured Materials PDF

Author: Nicola Pinna

Publisher: John Wiley & Sons

Published: 2012-09-19

Total Pages: 472

ISBN-13: 3527639934

DOWNLOAD EBOOK →

Atomic layer deposition, formerly called atomic layer epitaxy, was developed in the 1970s to meet the needs of producing high-quality, large-area fl at displays with perfect structure and process controllability. Nowadays, creating nanomaterials and producing nanostructures with structural perfection is an important goal for many applications in nanotechnology. As ALD is one of the important techniques which offers good control over the surface structures created, it is more and more in the focus of scientists. The book is structured in such a way to fi t both the need of the expert reader (due to the systematic presentation of the results at the forefront of the technique and their applications) and the ones of students and newcomers to the fi eld (through the first part detailing the basic aspects of the technique). This book is a must-have for all Materials Scientists, Surface Chemists, Physicists, and Scientists in the Semiconductor Industry.

Atomic Layer Deposition for Semiconductors

Atomic Layer Deposition for Semiconductors PDF

Author: Cheol Seong Hwang

Publisher: Springer Science & Business Media

Published: 2013-10-18

Total Pages: 266

ISBN-13: 146148054X

DOWNLOAD EBOOK →

Offering thorough coverage of atomic layer deposition (ALD), this book moves from basic chemistry of ALD and modeling of processes to examine ALD in memory, logic devices and machines. Reviews history, operating principles and ALD processes for each device.

Handbook of Crystal Growth

Handbook of Crystal Growth PDF

Author: Peter Rudolph

Publisher: Elsevier

Published: 2014-11-04

Total Pages: 1420

ISBN-13: 0444633065

DOWNLOAD EBOOK →

Vol 2A: Basic TechnologiesHandbook of Crystal Growth, Second Edition Volume IIA (Basic Technologies) presents basic growth technologies and modern crystal cutting methods. Particularly, the methodical fundamentals and development of technology in the field of bulk crystallization on both industrial and research scales are explored. After an introductory chapter on the formation of minerals, ruling historically the basic crystal formation parameters, advanced basic technologies from melt, solution, and vapour being applied for research and production of the today most important materials, like silicon, semiconductor compounds and oxides are presented in detail. The interdisciplinary and general importance of crystal growth for human live are illustrated.Vol 2B: Growth Mechanisms and DynamicsHandbook of Crystal Growth, Second Edition Volume IIB (Growth Mechanisms and Dynamics) deals with characteristic mechanisms and dynamics accompanying each bulk crystal growth method discussed in Volume IIA. Before the atoms or molecules pass over from a position in the fluid medium (gas, melt or solution) to their place in the crystalline face they must be transported in the fluid over macroscopic distances by diffusion, buoyancy-driven convection, surface-tension-driven convection, and forced convection (rotation, acceleration, vibration, magnetic mixing). Further, the heat of fusion and the part carried by the species on their way to the crystal by conductive and convective transport must be dissipated in the solid phase by well-organized thermal conduction and radiation to maintain a stable propagating interface. Additionally, segregation and capillary phenomena play a decisional role for chemical composition and crystal shaping, respectively. Today, the increase of high-quality crystal yield, its size enlargement and reproducibility are imperative conditions to match the strong economy. Volume 2A Presents the status and future of Czochralski and float zone growth of dislocation-free silicon Examines directional solidification of silicon ingots for photovoltaics, vertical gradient freeze of GaAs, CdTe for HF electronics and IR imaging as well as antiferromagnetic compounds and super alloys for turbine blades Focuses on growth of dielectric and conducting oxide crystals for lasers and non-linear optics Topics on hydrothermal, flux and vapour phase growth of III-nitrides, silicon carbide and diamond are explored Volume 2B Explores capillarity control of the crystal shape at the growth from the melt Highlights modeling of heat and mass transport dynamics Discusses control of convective melt processes by magnetic fields and vibration measures Includes imperative information on the segregation phenomenon and validation of compositional homogeneity Examines crystal defect generation mechanisms and their controllability Illustrates proper automation modes for ensuring constant crystal growth process Exhibits fundamentals of solution growth, gel growth of protein crystals, growth of superconductor materials and mass crystallization for food and pharmaceutical industries

Nanostructured Thin Films

Nanostructured Thin Films PDF

Author: Maria Benelmekki

Publisher: Elsevier

Published: 2019-08-25

Total Pages: 334

ISBN-13: 0081025734

DOWNLOAD EBOOK →

Nanostructured Thin Films: Fundamentals and Applications presents an overview of the synthesis and characterization of thin films and their nanocomposites. Both vapor phase and liquid phase approaches are discussed, along with the methods that are sufficiently attractive for large-scale production. Examples of applications in clean energy, sensors, biomedicine, anticorrosion and surface modification are also included. As the applications of thin films in nanomedicine, cell phones, solar cell-powered devices, and in the protection of structural materials continues to grow, this book presents an important research reference for anyone seeking an informed overview on their structure and applications. Shows how thin films are being used to create more efficient devices in the fields of medicine and energy harvesting Discusses how to alter the design of nanostructured thin films by vapor phase and liquid phase methods Explores how modifying the structure of thin films for specific applications enhances their performance

Nanostructures and Nanomaterials

Nanostructures and Nanomaterials PDF

Author: Guozhong Cao

Publisher: World Scientific Publishing Company

Published: 2011-01-03

Total Pages: 596

ISBN-13: 981310077X

DOWNLOAD EBOOK →

This is the 2nd edition of the original “Nanostructures and Nanomaterials” written by Guozhong Cao and published by Imperial College Press in 2004. This important book focuses not only on the synthesis and fabrication of nanostructures and nanomaterials, but also includes properties and applications of nanostructures and nanomaterials, particularly inorganic nanomaterials. It provides balanced and comprehensive coverage of the fundamentals and processing techniques with regard to synthesis, characterization, properties, and applications of nanostructures and nanomaterials. Both chemical processing and lithographic techniques are presented in a systematic and coherent manner for the synthesis and fabrication of 0-D, 1-D, and 2-D nanostructures, as well as special nanomaterials such as carbon nanotubes and ordered mesoporous oxides. The book will serve as a general introduction to nanomaterials and nanotechnology for teaching and self-study purposes.